摘要 | 第4-7页 |
Abstract | 第7-9页 |
List of Symbols and Abbreviations | 第17-20页 |
Chapter 1 Introduction | 第20-40页 |
1.1 Background | 第20-22页 |
1.2 Light Emitting Diodes | 第22-24页 |
1.3 Thermophotovoltaic | 第24-36页 |
1.3.1 TPV System Efficiency | 第27-28页 |
1.3.2 The Emitter | 第28-32页 |
1.3.3 The Filter | 第32-34页 |
1.3.4 The TPV Cell | 第34-36页 |
1.4 Numerical Method | 第36-38页 |
1.5 Thesis Scope | 第38页 |
1.6 Methodology | 第38页 |
1.7 Thesis Organization | 第38-40页 |
Chapter 2 Numerical Method and Modeling | 第40-61页 |
2.1 Introduction | 第40页 |
2.2 One-Dimensional Rigorous Coupled-wave Analysis Method | 第40-41页 |
2.3 Rigorous Coupled-Wave Analysis Method for TE Wave | 第41-48页 |
2.4 Boundary Conditions | 第48-49页 |
2.5 Rigorous Coupled-Wave Analysis for TM Wave | 第49-53页 |
2.6 Rigorous Coupled-Wave Analysis for Conical Diffraction | 第53-61页 |
Chapter 3 Tailoring the Emission/Transmission Spectra of Micro/Nanostructures | 第61-79页 |
3.1 Introduction | 第61页 |
3.2 Selective Emitter | 第61-74页 |
3.2.1 Comparison and Simulation for Gratings Selective Emitter | 第61-67页 |
3.2.2 Comparison and Simulation for Multilayer Selective Emitter | 第67-70页 |
3.2.3 Comparison and Simulation of Complex gratings Selective Emitter | 第70-74页 |
3.3 Selective Filter | 第74-79页 |
3.3.1 Comparison and Simulation for Multilayer Selective Filter | 第74-75页 |
3.3.2 Simulation for Multilayer Selective Filter | 第75-79页 |
Chapter 4 Enhancement of BRDF/BTDF Properties using Nanostructures | 第79-105页 |
4.1 Introduction | 第79-80页 |
4.2 Comparison and Simulation for Top Micro/nanostructures gratings LEDs | 第80-86页 |
4.2.1 Numerical Study by RCWA | 第80-84页 |
4.2.2 Comparison of the Results by Different Methods | 第84-86页 |
4.3 Simulation of the Top Micro/Nanostructures Gratings LEDs | 第86-89页 |
4.4 Simulation of the Bottom Micro/Nanostructures Gratings LEDs | 第89-92页 |
4.5 Three Axis Automated Scatterometer Instrument | 第92-97页 |
4.6 Effect of the Polarization on the BRDF and BTDF of the Samples | 第97-100页 |
4.6.1 BRDF Measurements for 1D 5-layer W/SiO_2 Sample | 第97-98页 |
4.6.2 BRDF Measurements for 1D 8-layer Si/SiO_2 Sample | 第98-99页 |
4.6.3 BTDF Measurements for 1D 8-layer Si/SiO_2 Sample | 第99-100页 |
4.7 Effect of the Plane of Incidence on the BRDF of the Samples | 第100-105页 |
4.7.1 Effect of the Plane of Incidence on the BRDF of 1D 5-layer W/SiO_2 Sample | 第100-102页 |
4.7.2 Effect of the Plane of Incidence on BRDF of 1D 8-layer Si/SiO_2 Sample | 第102-105页 |
Chapter 5 Radiative Properties Measurements of Emitter and Filter with Nanostructures | 第105-129页 |
5.1 Introduction | 第105页 |
5.2. Instrumentation | 第105-115页 |
5.2.1 Magnetron Sputtering | 第105-108页 |
5.2.2 Ion Etching Coating System | 第108-110页 |
5.2.3 Scanning Electron Microscopy | 第110-113页 |
5.2.4 The Spectral Transmittance and Reflectance Measurement System | 第113-115页 |
5.3 Selective Emitter and Filter Design and Fabrication | 第115-117页 |
5.4 Emittance Measurements for 1D 5-layer W/SiO_2 Sample | 第117-121页 |
5.5 Reflectance Measurements for 1D 8-layer Si/SiO_2 Sample | 第121-123页 |
5.6 Transmittance Measurements for 1D 8-layer Si/SiO_2 Sample | 第123-125页 |
5.7 TPV System Performance | 第125-127页 |
5.8 TPV System Optimization Design | 第127-129页 |
Conclusions and Recommendations | 第129-135页 |
6.1 Conclusions | 第129-134页 |
6.2 Suggestions for Further Research | 第134-135页 |
References | 第135-150页 |
List of publications during the period of Ph.D. education | 第150-154页 |
Acknowledgements | 第154-155页 |
Resume | 第155页 |