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Preparation and Characterization of Polymer LB Films for Lithography

1 Preface第8-29页
    1.1 Introduction of lithography第8-12页
    1.2 Introduction of Langmuir-Blodgett technique第12-23页
        1.2.1 Introduction of several kinds of films technique第13-16页
        1.2.2 Langmuir-Blodgett technique第16-20页
            1.2.2.1 Materials of preparing LB films第16页
            1.2.2.2 The preparation of Langmuir monolayer at air/subphase interface第16-18页
            1.2.2.3 Instrument of preparation LB films第18-20页
        1.2.3 Monolayer and multilayers deposition第20-23页
    1.3 Characterization techniques of LB films第23-28页
        1.3.1 Infrared spectroscopy第24页
        1.3.2 X-ray scattering第24页
        1.3.3 Electron diffraction第24-25页
        1.3.4 Ellipsometry and optical reflectometry第25页
        1.3.5 Surface analytical techniques第25页
        1.3.6 Electron microscopy第25-26页
        1.3.7 Optical microscopy第26页
        1.3.8 Scanning probe microscopy第26-28页
    1.4 Ideas and plans第28-29页
2 Preparation and Characterization of Monomer N-alkylacrylamide and Their Polymerization第29-37页
    2.1 Materials第29页
    2.2 Instruments第29-30页
    2.3 Process of experiments第30-37页
        2.3.1 Synthesis of N-dodecylmethacrylamide(DDMA)第30-31页
        2.3.2 Synthesis of N-dodecylacrylamide(DDA)第31-32页
        2.3.3 Synthesis of N-hexadecylacrylamide(HDA)第32页
        2.3.4 Synthesis of N-hexadecylmethylacrylamide(HDMA)第32-33页
        2.3.5 Synthesis of 1,4-dioxaspiro[4,4]nonane-2-methyl methacrylate(DNMMA)第33-34页
        2.3.6 Polymerization of N-alkylacrylamide with 1,4-dioxaspiro[4,4]nonane-2-methyl methacrylate(DNMMA)第34-35页
        2.3.7 p-A isotherms and LB films第35-36页
        2.3.8 Measurements第36页
        2.3.9 Photolithography第36-37页
3 Studies on Langmuir Films at Air-water Interface第37-41页
    3.1 Influence of different conditions on Langmuir films第37-39页
    3.2 p-A isotherms of different monomer and polymers第39-41页
4. Studies on Copolymer LB Films第41-52页
    4.1 p-A isotherms of copolymers第41-42页
    4.2 Surface elastic behavior of Langmuir films第42-45页
    4.3 UV measurements of LB films第45-46页
    4.4 Studies by atomic force microscope第46-52页
        4.4.1 Topography of Spin-coating Film and LB Film第46-47页
        4.4.2 Morphology of p(DDMA-DNMMA)monolayer第47-48页
        4.4.3 Different ways of deposition第48-49页
        4.4.4 Different preparation of monolayers第49-52页
5 Preliminary Studies on Photolithography第52-56页
    5.1 Photodecomposition of copolymer LB films第52-53页
    5.2 Photopatterning第53-56页
6 Conclusions第56-57页
References第57-61页
PaPers第61-62页
Acknowledgements第62-63页
Addenda第63-68页

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