| ABSTRACT | 第5页 |
| 1. Introduction | 第8-10页 |
| 2: Method for generation of spatially uniform VHF plasma | 第10-24页 |
| 2.1 Characteristics of Large scale VHF plasma and industrial applicationthereof | 第10-16页 |
| 2.1.1 Principle of plasma generation in capacitively coupled plasma | 第10-15页 |
| 2.1.2 Industrial application of VHF plasma | 第15-16页 |
| 2.2 Propagation of electromagnetic wave and spatially localization of largescale VHF plasma | 第16-23页 |
| 2.2.1 Distributed-constant electric circuit | 第16-19页 |
| 2.2.2 Lossless line | 第19页 |
| 2.2.3 Traveling wave and reflected wave | 第19-20页 |
| 2.2.4 Standing wave | 第20-22页 |
| 2.2.5 Double ridge waveguide | 第22-23页 |
| 2.3 Generation of spatially uniform large scale VHF plasma by control of thestanding wave | 第23-24页 |
| 2.3.1 The control of the plasma generation position by input impedancechange | 第23页 |
| 2.3.2 The control of the plasma generation position by phasemodulation | 第23-24页 |
| 3: Spatially uniformizing of large scale VHF plasma by terminal impedance change | 第24-47页 |
| 3.1 Introduction | 第24页 |
| 3.2 Experimental setup and method | 第24-34页 |
| 3.2.1 The evaluation method of spatially uniformity of the plasma | 第27-34页 |
| 3.2.1.1 Electron temperature and Electron density measurement bydouble probe | 第27-31页 |
| 3.2.1.2 Probe used in the experiment | 第31-32页 |
| 3.2.1.3 Circuit of probe measurement | 第32-33页 |
| 3.2.1.4 Measurement of the emission intensity by pin photo diode | 第33-34页 |
| 3.3 Experimental results | 第34-41页 |
| 3.3.1 Change of the plasma generation position by connecting terminalimpedance | 第34-38页 |
| 3.3.1.1 Measurement results of the double probe | 第36-37页 |
| 3.3.1.2 Measurement results of the emission intensity by pin photodiode | 第37-38页 |
| 3.3.2 Generation of spatially uniform plasma | 第38-41页 |
| 3.3.2.1 Automatically sweeping of the plasma generation position | 第39-41页 |
| 3.4 Simulation of the voltage standing wave distribution | 第41-46页 |
| 3.4.1 Measurement and calculation of the characteristic impedance of theelectrode | 第42页 |
| 3.4.2 Standing wave distribution before discharge start | 第42-44页 |
| 3.4.3 Standing wave distribution after discharge start | 第44-46页 |
| 3.5 Summary | 第46-47页 |
| 4. Spatially uniformizing of large scale VHF plasma by phase modulation indouble ridge waveguide | 第47-77页 |
| 4.1 Introduction | 第47页 |
| 4.2 Plasma source using double ridge wave guide | 第47-60页 |
| 4.2.1 Double ridge waveguide | 第47-49页 |
| 4.2.2 Simulation of electromagnetic wave in waveguide and advantageof double ridge waveguide | 第49-60页 |
| 4.3 Experimental setup | 第60-67页 |
| 4.3.1 The evaluation method of spatially uniformity of the plasma | 第62-63页 |
| 4.3.2 Measurement of electron density and electron temperature by singleprobe | 第63-67页 |
| 4.4 Experimental results | 第67-76页 |
| 4.4.1 Generation of line plasma in Ar | 第67-70页 |
| 4.4.2 Measurement result of light emission distribution by CCDcamera | 第70-74页 |
| 4.4.3 Measurement result of electron density and electron temperature bysingle probe | 第74-76页 |
| 4.5 Summary | 第76-77页 |
| 5. Conclusion and future plans | 第77-78页 |
| 5.1 Conclusion | 第77页 |
| 5.1.1 Spatially uniformizing of large scale VHF plasma by terminalimpedance change in parallel plate electrode | 第77页 |
| 5.1.2 Spatially uniformizing of large scale VHF plasma by phasemodulation in double ridge waveguide | 第77页 |
| 5.2 Future plans | 第77-78页 |
| Reference | 第78-80页 |
| Acknowledgement | 第80页 |
