| ABSTRACT | 第4-5页 |
| PREFACE | 第6-7页 |
| LIST OF PUBLICATION | 第7-8页 |
| LIST OF ABBREVIATION AND ACRONYMS | 第8-17页 |
| Chapter 1 | 第17-64页 |
| 1.1 Introduction | 第17-20页 |
| 1.1.1 Research content | 第17-18页 |
| 1.1.2 Key research challenges | 第18-19页 |
| 1.1.3 Research objectives | 第19页 |
| 1.1.4 Research target | 第19-20页 |
| 1.2 Background | 第20-30页 |
| 1.2.1 Introduction to atomic layer deposition | 第20-23页 |
| 1.2.2 Reaction mechanism | 第23-26页 |
| 1.2.3 The growth theory of ALD | 第26-27页 |
| 1.2.4 Characteristic of ALD growth | 第27-30页 |
| 1.3 ALD on a flat surface | 第30-31页 |
| 1.4 ALD on complex surface | 第31-35页 |
| 1.5 ALD on polymers | 第35-39页 |
| 1.5.1 ALD on polymer with lack of surface functional groups | 第35-37页 |
| 1.5.2 ALD on polymer with numerous functional groups | 第37-39页 |
| 1.6 Anodic aluminum oxide porous | 第39-43页 |
| 1.6.1 Introduction to anodic aluminum oxide | 第39-40页 |
| 1.6.2 Anodic aluminum oxide theory | 第40-43页 |
| 1.7 Photocatalysis principle | 第43-48页 |
| 1.7.1 Concept of semiconductor photocatalysis | 第43-46页 |
| 1.7.2 TiO_2 photocatalyst | 第46-48页 |
| 1.8 Two dimensional materials | 第48-49页 |
| 1.9 Concluding remarks | 第49-52页 |
| References | 第52-64页 |
| Chapter 2 Influence of reactive surface groups on the deposition of oxides thin film by ALD | 第64-82页 |
| 2.1 Introduction to reactive surface groups for ALD initial growth | 第65页 |
| 2.2 Experimental methods | 第65-67页 |
| 2.3 Results and discussion | 第67-78页 |
| 2.3.1 Thickness and surface morphologies | 第67-70页 |
| 2.3.2 Infrared spectra of PET and Si-coated ALD | 第70-72页 |
| 2.3.3 Wettability of the deposited oxides film | 第72-75页 |
| 2.3.4 XRD spectra of the PET-coated ALD | 第75-76页 |
| 2.3.5 Chemical composition of the deposited oxides film | 第76-78页 |
| 2.4 Concluding remarks | 第78-79页 |
| References | 第79-82页 |
| Chapter 3 Atomic layer deposition for complex surface | 第82-93页 |
| 3.1 Introduction to ALD for complex surface | 第83-84页 |
| 3.2 Experimental methods | 第84-85页 |
| 3.3 Results and discussion | 第85-90页 |
| 3.3.1 Oxides ALD for complex surfaces | 第85-88页 |
| 3.3.2 Influence of ALD cycle on uniformity and aspect ratio | 第88-90页 |
| 3.4 Concluding remarks | 第90页 |
| References | 第90-93页 |
| Chapter 4 Atomic layer deposition for hexagonally ordered nanoporesof anodic aluminum oxide | 第93-107页 |
| 4.1 Introduction to anodic aluminum oxide | 第94-95页 |
| 4.2 Experimental methods | 第95-96页 |
| 4.3 Results and discussion | 第96-104页 |
| 4.3.1 Sample preparation | 第96-97页 |
| 4.3.2 AAO porous formed with various anodization time | 第97-100页 |
| 4.3.3 Effect of anodization time on hexagonal size, pores size, interpore distance, and AAO porosity | 第100-103页 |
| 4.3.4 Atomic layer deposition on AAO porous | 第103-104页 |
| 4.4 Concluding remarks | 第104-105页 |
| References | 第105-107页 |
| Chapter 5 Two-dimensional (2D) metal oxides nanomembranessynthesized by atomic layer deposition | 第107-122页 |
| 5.1 Introduction to two-dimensional nanomembranes | 第108-109页 |
| 5.2 Experimental methods | 第109-110页 |
| 5.3 Results and discussion | 第110-118页 |
| 5.3.1 Morphologies and receding rate contact angle of thecoated PAA surface | 第110-112页 |
| 5.3.2 Al_2O_3 nanomembranes produced with PMMA as asacrificial layer | 第112-113页 |
| 5.3.3 2D TiO_2 nanomembranes exfoliation with mechanicallyscratch and dissolution techniques | 第113-115页 |
| 5.3.4 Influence of the dissolvable substrates on ZrO_2 nanomembranes fabrication | 第115-117页 |
| 5.3.5 Calcination for 2D nanomembranes fabrication | 第117-118页 |
| 5.4 Concluding remarks | 第118-119页 |
| References | 第119-122页 |
| Chapter 6 TiO_2 nanomembranes synthesized by ALD for photocatalysisapplication | 第122-143页 |
| 6.1 Introduction to ALD for 2D nanomembranes fabrication | 第123页 |
| 6.2 Experimental methods | 第123-126页 |
| 6.3 Results and discussion | 第126-139页 |
| 6.3.1 Schematic of 2D nanomembranes fabrication | 第126-127页 |
| 6.3.2 Characteristics of the formed 2D TiO_2 nanomembranes | 第127-131页 |
| 6.3.3 Residual stress changes between the flexible substrate andthe film in the 2D nanomembranes formation | 第131-132页 |
| 6.3.4 The required ALD film on polymer sacrificial layer to form 2D nanomembranes | 第132-134页 |
| 6.3.5 Thickness and surface area of 2D nanomembranes formedwith various ALD cycles | 第134-135页 |
| 6.3.6 XRD measurement of 2D TiO_2 nanomembranes | 第135-136页 |
| 6.3.7 Chemical composition of 2D TiO_2 nanomembranes | 第136-137页 |
| 6.3.8 Photocatalytic performance of TiO_2 nanomembranes | 第137-139页 |
| 6.4 Concluding remarks | 第139页 |
| References | 第139-143页 |
| Chapter 7 Crystallized metal oxides nanomembranes synthesized byatomic layer deposition | 第143-154页 |
| 7.1 Introduction to ALD for metal oxides materials | 第144-145页 |
| 7.2 Experimental methods | 第145-146页 |
| 7.3 Results and discussions | 第146-152页 |
| 7.3.1 Metal oxides nanomembranes fabrication | 第146页 |
| 7.3.2 Crystallized metal oxides nanomembranes synthesized byALD | 第146-147页 |
| 7.3.3 SEM images of metal oxides nanomembrane synthesizedby ALD | 第147-149页 |
| 7.3.4 XRD spectra of crystallized nanomembranes | 第149-150页 |
| 7.3.5 TEM images of crystallized nanomembranes | 第150-152页 |
| 7.4 Concluding remarks | 第152页 |
| References | 第152-154页 |
| Chapter 8 Abstract: TiO_2 nanomembrane and its composite synthesized by atomiclayer deposition as photocatalysts with enhanced performance | 第154-177页 |
| 8.1 Introduction to semiconductor for photocatalysis | 第155-156页 |
| 8.2 Experimental methods | 第156-157页 |
| 8.3 Results and discussion | 第157-173页 |
| 8.3.1 Nanomembranes fabrication | 第157-158页 |
| 8.3.2 The thicknesses of TiO_2 and TiO_2-Zn O nanomembranes | 第158-159页 |
| 8.3.3 Morphologies of TiO_2 and TiO_2-ZnO nanomembranes | 第159-161页 |
| 8.3.4 Morphologies of graphene and graphene-TiO_2composites | 第161-162页 |
| 8.3.5 XRD spectra of TiO_2 and TiO_2-Zn O nanomembranes | 第162-164页 |
| 8.3.6 Photocatalytic performance of TiO_2 and TiO_2-Zn Onanomembranes | 第164-171页 |
| 8.3.7 Effect of calcination temperature on TiO_2 nanomembranewith low degree of local order | 第171-172页 |
| 8.3.8 Photocatalyst performance of graphene and graphene-TiO_2 composite | 第172-173页 |
| 8.4 Concluding remarks | 第173页 |
| References | 第173-177页 |
| Chapter 9 Abstract: Aluminum-doped zinc oxide nanomembrane synthesized byatomic layer deposition for photocatalysis | 第177-195页 |
| 9.1 Introduction to semiconductor materials | 第178-179页 |
| 9.2 Experimental methods | 第179-180页 |
| 9.3 Results and discussion | 第180-191页 |
| 9.3.1 Fabrication of Al-doped ZnO nanomembrane | 第180-181页 |
| 9.3.2 Morphologies and XRD spectra of ZnO and Al-doped ZnO | 第181-183页 |
| 9.3.3 Chemical composition of ZnO and Al-doped ZnO | 第183-186页 |
| 9.3.4 Optical properties of ZnO & Al-doped ZnO | 第186-188页 |
| 9.3.5 Photocatalytic performances of ZnO and AZO nanomembranes | 第188-191页 |
| 9.4 Concluding remarks | 第191页 |
| References | 第191-195页 |
| Chapter 10 Summary and outlook | 第195-203页 |
| 10.1 Atomic layer deposition, 2D materials fabrication, andphotocatalysis | 第195-199页 |
| 10.2 Problems that have been solved and future challenges | 第199-200页 |
| 10.3 Innovation summary | 第200-202页 |
| References | 第202-203页 |
| Conclusions | 第203-204页 |
